Optical interference filters with continuous refractive index modulations by microwave plasma-assisted chemical vapor deposition

Adrian C. Greenham; Bruce A. Nichols; Roger M. Wood; Noorallah Nourshargh; Keith L. Lewis

doi:10.1117/12.130253

1 May 1993 Optical interference filters with continuous refractive index modulations by microwave plasma-assisted chemical vapor deposition

Adrian C. Greenham, Bruce A. Nichols, Roger M. Wood, Noorallah Nourshargh, Keith L. Lewis

Author Affiliations +

Optical Engineering, Vol. 32, Issue 5, (May 1993). https://doi.org/10.1117/12.130253

Abstract

Optical interference filters that have continuously modulated refractive indices throughout their thicknesses (rugates) are designed and fabricated using a microwave plasma-assisted chemical vapor deposition technique. Examples are shown of single- and double-response narrowband reflection filters made from variable composition silicon oxynitride deposited on silica. Reflectivities in excess of 99.9% have been realized with bandwidths in the 2 to 10% range.

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Adrian C. Greenham, Bruce A. Nichols, Roger M. Wood, Noorallah Nourshargh, and Keith L. Lewis "Optical interference filters with continuous refractive index modulations by microwave plasma-assisted chemical vapor deposition," Optical Engineering 32(5), (1 May 1993). https://doi.org/10.1117/12.130253

Published: 1 May 1993

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