Pulsed-laser deposition of thin-film process characterization by optical spectroscopy

Ileana Apostol; Razvan Stoian

doi:10.1117/1.601028

1 May 1996 Pulsed-laser deposition of thin-film process characterization by optical spectroscopy

Ileana Apostol, Razvan Stoian

Optical Engineering, Vol. 35, Issue 5, (May 1996). https://doi.org/10.1117/1.601028

Spectral analysis of CO2-TE-laser-ablated plasma on YBa2Cu3O72-x targets demonstrates a very complex spectrum with emission lines from atomic and ionic species. Plasma temperature is estimated at different moments in its evolution. A good accordance with the values achieved by considering an adiabatic plasma expansion is obtained. Plasma emission intensity is studied as a function of laser pulse energy and, for the same incident energies, a very reproducible amplitude is evidenced. Using a hydrodynamic model, plasma parameters are calculated.

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Ileana Apostol and Razvan Stoian "Pulsed-laser deposition of thin-film process characterization by optical spectroscopy," Optical Engineering 35(5), (1 May 1996). https://doi.org/10.1117/1.601028

Published: 1 May 1996

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