Articles

Ultraviolet light imprinted sol-gel silica glass low-loss waveguides for use at 1.55 μm

[+] Author Affiliations
Paul Coudray

Ecole Polytechnique, Photonics Research Group, Montreal, Quebec H3C 3A7 and McGill University, Department of Chemistry, Montreal, Quebec H3A 2K6

Mark P. Andrews

McGill University, Department of Chemistry Montreal, Quebec H3A 2K6

S. Iraj Najafi

Ecole Polytechnique, Photonics Research Group, Montreal, Quebec H3C 3A7

Opt. Eng. 36(4), 1234-1240 (Apr 01, 1997). doi:10.1117/1.601243
History: Received May 28, 1996; Revised Oct. 21, 1996; Accepted Oct. 21, 1996
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Abstract

The fabrication and characterization of UV-light-imprinted sol-gel silica glass waveguides on glass and silicon substrates are described. Waveguide fabrication parameters are evaluated. Appropriate combinations of UV light exposure time, sol-gel film thickness, and postbake time produce waveguides suitable for use at a 1.55-μm wavelength. Propagation losses in these waveguides are less than 0.3 dB/cm. © 1997 Society of Photo-Optical Instrumentation Engineers.

© 1997 Society of Photo-Optical Instrumentation Engineers

Citation

Paul Coudray ; J. Chisham ; Mark P. Andrews and S. Iraj Najafi
"Ultraviolet light imprinted sol-gel silica glass low-loss waveguides for use at 1.55 μm", Opt. Eng. 36(4), 1234-1240 (Apr 01, 1997). ; http://dx.doi.org/10.1117/1.601243


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