1 December 1997 Rapid pattern inspection of shadow masks by machine vision integrated with Fourier optics
Seung-Woo Kim, SangYoon Lee, Dong-Seon Yoon
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We present a machine vision inspection method that is specially devised to detect defects on shadow masks. This method incorporates Fourier optics to capture only irregular defects in real time by blocking out the periodically repetitive pattern of normal mask holes using a pinhole type spatial filter under coherent illumination. In addition, a fast defect-detection image processing algorithm efficiently suppresses undesirable background noisy images. Experimental results prove that this method provides a detection capability of 500 ?m2 for the least defect size.
Seung-Woo Kim, SangYoon Lee, and Dong-Seon Yoon "Rapid pattern inspection of shadow masks by machine vision integrated with Fourier optics," Optical Engineering 36(12), (1 December 1997). https://doi.org/10.1117/1.601570
Published: 1 December 1997
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Cited by 5 scholarly publications.
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KEYWORDS
Inspection

Fourier optics

Machine vision

Photomasks

Image processing

Spatial filters

Optical inspection

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