Holographic characterization of epoxy resins at 351.1 nm

Maria Farsari; Shiping Huang; Rupert C. D. Young; Malcolm I. Heywood; Patrick J. B. Morrell; Christopher R. Chatwin

doi:10.1117/1.601815

1 October 1998 Holographic characterization of epoxy resins at 351.1 nm

Maria Farsari, Shiping Huang, Rupert C. D. Young, Malcolm I. Heywood, Patrick J. B. Morrell, Christopher R. Chatwin

Optical Engineering, Vol. 37, Issue 10, (October 1998). https://doi.org/10.1117/1.601815

The optical characteristics of two commercially available UV curable epoxy resins are investigated using nondegenerate four-wave mixing. The materials assessed are optimized for use with a UV argonion laser. The holographic gratings were written at a wavelength of ? 5351.1 nm for an irradiance range 0.5 to 3.0 W/cm2 and read at ? 5632.8 nm to compare the reactivity, curing speed, shrinkage, and resolution of the resins. These experiments were carried out to prove the suitability of the photopolymerization systems for microstereolithography.

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Maria Farsari, Shiping Huang, Rupert C. D. Young, Malcolm I. Heywood, Patrick J. B. Morrell, and Christopher R. Chatwin "Holographic characterization of epoxy resins at 351.1 nm," Optical Engineering 37(10), (1 October 1998). https://doi.org/10.1117/1.601815

Published: 1 October 1998

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