Investigation of the optical properties of sputtered ZnO films by reflectance spectroscopy

Bo Huang; Jing Li; Donghui Guo; Suntao Wu

doi:10.1117/1.2402102

1 December 2006 Investigation of the optical properties of sputtered ZnO films by reflectance spectroscopy

Bo Huang, Jing Li, Donghui Guo, Suntao Wu

Author Affiliations +

Optical Engineering, Vol. 45, Issue 12, 123801 (December 2006). https://doi.org/10.1117/1.2402102

Abstract

ZnO films have been deposited on SiO₂/Si substrates by rf magnetron sputtering. The rms roughness of the sample's surface was surveyed by using an atomic force microscope, and is less than 10 nm. The theoretical reflectance of the air/film/middle layer/substrate structure has been deduced. In the light of this theoretical reflectance, the complex refractive index ñ(λ)=n(λ)+ik(λ) of the sample below the interband absorption edge has been fitted with a Lorentz oscillator model. The absorption coefficient α(λ) of the sample is reported, and the result shows the sample has weak absorption around 490 nm.

©(2006) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Bo Huang, Jing Li, Donghui Guo, and Suntao Wu "Investigation of the optical properties of sputtered ZnO films by reflectance spectroscopy," Optical Engineering 45(12), 123801 (1 December 2006). https://doi.org/10.1117/1.2402102

Published: 1 December 2006

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