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Thin Films

Optical properties of amorphous hydrogenated silicon nitride thin films

[+] Author Affiliations
Arllene M. Pérez

Universidad Popular Autónoma del Estado de Puebla (UPAEP), 13 Pte 1929, Col. Santiago, CP 72160, Puebla, Pue. México

César Santiago

Universidad Politécnica de Tulancingo, Prolongación Guerrero 808 Col. Caltengo, CP 43626, Tulancingo, Hgo. México

Francisco Renero

Instituto Nacional de Astrofìsica, Óptica y Electrónica (INAOE), Luis E. Erro # 1, Santa Marìa Tonantzintla, CP 72840, Puebla, México

Carlos Zuñiga

Instituto Nacional de Astrofìsica, Óptica y Electrónica (INAOE), Luis E. Erro # 1, Santa Marìa Tonantzintla, CP 72840, Puebla, México

Opt. Eng. 45(12), 123802 (December 08, 2006). doi:10.1117/1.2402493
History: Received January 10, 2006; Revised May 18, 2006; Accepted May 23, 2006; Published December 08, 2006
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This paper presents a study of the optical properties of amorphous hydrogenated silicon nitride (a-Si3N4:H) films under deposition temperature influence. The films were deposited by low-frequency plasma-enhanced chemical vapor deposition at temperatures of 200, 300, and 400°C and 0.6-Torr pressure. The mixture gases were silane (SiH4), ammonia (NH3), and hydrogen (H2). The optical properties of the films samples were obtained by means of the transmittance spectra and from spectroellipsometry measurements. Then, the optical parameters of the films were determined using the Swanepoel, Cauchy, and Sellmeier models. The refractive index dispersion curves were well fitted with both the Cauchy and the Sellmeier theoretical model. The equivalence between the parameters that characterize the two models is established.

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© 2006 Society of Photo-Optical Instrumentation Engineers

Citation

Arllene M. Pérez ; César Santiago ; Francisco Renero and Carlos Zuñiga
"Optical properties of amorphous hydrogenated silicon nitride thin films", Opt. Eng. 45(12), 123802 (December 08, 2006). ; http://dx.doi.org/10.1117/1.2402493


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