Instrumentation, Measurement, and Metrology

Alignment measurement method for imprint lithography using moiré fringe pattern

[+] Author Affiliations
Jinyou Shao

Xi’an Jiaotong University, The State Key Lab for Manufacturing Systems Engineering, 28, Xianning West Road, Xi’an, Shaanxi 710049, China

Hongzhong Liu

Xi’an Jiaotong University, The State Key Lab for Manufacturing Systems Engineering, 28, Xianning West Road, Xi’an, Shaanxi 710049, China

Yucheng Ding

Xi’an Jiaotong University, The State Key Lab for Manufacturing Systems Engineering, 28, Xianning West Road, Xi’an, Shaanxi 710049, China

Li Wang

Xi’an Jiaotong University, The State Key Lab for Manufacturing Systems Engineering, 28, Xianning West Road, Xi’an, Shaanxi 710049, China

Binghen Lu

Xi’an Jiaotong University, The State Key Lab for Manufacturing Systems Engineering, 28, Xianning West Road, Xi’an, Shaanxi 710049, China

Opt. Eng. 47(11), 113604 (November 21, 2008). doi:10.1117/1.3028350
History: Received July 07, 2008; Revised September 21, 2008; Accepted October 06, 2008; Published November 21, 2008
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A simple and high-accuracy alignment measurement method based on a moiré fringe pattern is proposed. It involves relative rotation positioning and relative linear displacement measurement. Taking full advantage of the magnification effect of moiré fringe in angular and linear displacement, the relative rotation between the template and the wafer is determined first by measuring the inclination of the moiré fringe, and then the relative linear displacement between them is acquired by evaluating the spatial phase shift of two matched moiré fringes. The frequency components in the orthogonal directions of the fringe image obtained by a fast Fourier transform (FFT) and zooming process are used to measure the inclination of the moiré fringe. By selecting different orthogonal directions, a moiré fringe with any inclination can be measured accurately. When gratings are adjusted to parallel, a frequency-domain analysis is also used to extract the spatial phase of fringes at a given frequency. According to the relationship between spatial phase and linear displacement, the misalignment is detected. In experiments, the repeatability for the misalignment measurement has reached 4.8nm(3σ).

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© 2008 Society of Photo-Optical Instrumentation Engineers

Citation

Jinyou Shao ; Hongzhong Liu ; Yucheng Ding ; Li Wang and Binghen Lu
"Alignment measurement method for imprint lithography using moiré fringe pattern", Opt. Eng. 47(11), 113604 (November 21, 2008). ; http://dx.doi.org/10.1117/1.3028350


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