Fabrication of a waveguiding layer in Teflon AF by ion irradiation

Markus Leitz; R. P. Podgorsek; Hilmar Franke; Daniel Hernandez Cruz; Emile J. Knystautas; Roger A. Lessard

doi:10.1117/1.1385331

1 July 2001 Fabrication of a waveguiding layer in Teflon AF by ion irradiation

Markus Leitz, R. P. Podgorsek, Hilmar Franke, Daniel Hernandez Cruz, Emile J. Knystautas, Roger A. Lessard

Optical Engineering, Vol. 40, Issue 7, (July 2001). https://doi.org/10.1117/1.1385331

The modification of thin Teflon AF® films by He+ ion irradiation was investigated. As an integrated optical measurement technique, leaky-mode spectroscopy has been applied, and an increase of ?n = 8 x 10-3 for the real part of the refractive index has been found in the irradiated surface region of the film. The irradiated films can be regarded as a bilayer system consisting of a layer with low refractive index and a layer with high refractive index. The latter can be used as an optical waveguide with a substrate of unmodified Teflon AF. In addition, a decrease of the initial film thickness, an increase in UV absorption, and no significant increase in absorption of near-infrared light were found.

©(2001) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Markus Leitz, R. P. Podgorsek, Hilmar Franke, Daniel Hernandez Cruz, Emile J. Knystautas, and Roger A. Lessard "Fabrication of a waveguiding layer in Teflon AF by ion irradiation," Optical Engineering 40(7), (1 July 2001). https://doi.org/10.1117/1.1385331

Published: 1 July 2001

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