POLARIZATION

Polarization separation/combination based on self-imaging

[+] Author Affiliations
David M. Mackie

U.S. Army Research Laboratory, Optics Branch, AMSRL-SE-EM, 2800 Powder Mill Road, Adelphi, Maryland?20783 E-mail: dmackie@arl.mil

Tristan J. Tayag

Texas Christian University, Department of Engineering, TCU Box 298640, Fort Worth, Texas?76129

Ted E. Batchman

University of Nevada, Reno, College of Engineering, Office of the Dean, Room 256, Reno, Nevada?89557

Opt. Eng. 40(10), 2265-2272 (Oct 01, 2001). doi:10.1117/1.1402623
History: Received Apr. 12, 2000; Revised Mar. 12, 2001; Accepted Apr. 12, 2001
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An integrated optical device for the separation/combination of orthogonal polarizations is described. The device relies on simultaneous symmetric and antisymmetric 1×1 off-center self-imaging. Calculations show that 90% throughput and 0.1% crosstalk can often be attained, with device length less than or comparable to other integrated optical polarization separation devices. The device is passive, requires only a single mask, and is not restricted to a specific fabrication method or material system. Devices can even be made in isotropic material systems with a deep etch. Simulation results are presented for the lithium niobate and glass waveguide material systems. © 2001 Society of Photo-Optical Instrumentation Engineers.

© 2001 Society of Photo-Optical Instrumentation Engineers

Citation

David M. Mackie ; Tristan J. Tayag and Ted E. Batchman
"Polarization separation/combination based on self-imaging", Opt. Eng. 40(10), 2265-2272 (Oct 01, 2001). ; http://dx.doi.org/10.1117/1.1402623


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