Polarization separation/combination based on self-imaging

David M. Mackie; Tristan Jorge Tayag; Theodore E. Batchman

doi:10.1117/1.1402623

1 October 2001 Polarization separation/combination based on self-imaging

David M. Mackie, Tristan Jorge Tayag, Theodore E. Batchman

Optical Engineering, Vol. 40, Issue 10, (October 2001). https://doi.org/10.1117/1.1402623

An integrated optical device for the separation/combination of orthogonal polarizations is described. The device relies on simultaneous symmetric and antisymmetric 1 x 1 off-center self-imaging. Calculations show that 90% throughput and 0.1% crosstalk can often be attained, with device length less than or comparable to other integrated optical polarization separation devices. The device is passive, requires only a single mask, and is not restricted to a specific fabrication method or material system. Devices can even be made in isotropic material systems with a deep etch. Simulation results are presented for the lithium niobate and glass waveguide material systems.

©(2001) Society of Photo-Optical Instrumentation Engineers (SPIE)

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David M. Mackie, Tristan Jorge Tayag, and Theodore E. Batchman "Polarization separation/combination based on self-imaging," Optical Engineering 40(10), (1 October 2001). https://doi.org/10.1117/1.1402623

Published: 1 October 2001

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