Photoacoustic studies on n-type InP

Nibu A. George; C. P. G. Vallabhan; V. P. N. Nampoori; Periasamy Radhakrishnan

doi:10.1117/1.1419023

1 January 2002 Photoacoustic studies on n-type InP

Nibu A. George, C. P. G. Vallabhan, V. P. N. Nampoori, Periasamy Radhakrishnan

Optical Engineering, Vol. 41, Issue 1, (January 2002). https://doi.org/10.1117/1.1419023

We discuss an open photoacoustic cell study on sulfer-doped n-type InP wafer. The thermal diffusivity of the sample is evaluated from the phase data associated with the photoacoustic signal as a function of the modulation frequency under heat transmission configuration. Analysis is made on the basis of the Rosencwaig-Gersho theory and the results are compared with those from earlier reported photoacoustic studies of semiconductors. Our investigation clearly indicates that the instantaneous thermalization process is the major heat diffusion mechanism responsible for the photoacoustic signal generation in an InP sample.

©(2002) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Nibu A. George, C. P. G. Vallabhan, V. P. N. Nampoori, and Periasamy Radhakrishnan "Photoacoustic studies on n-type InP," Optical Engineering 41(1), (1 January 2002). https://doi.org/10.1117/1.1419023

Published: 1 January 2002

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