Fabrication method of Bragg gratings in silica channel optical waveguides

Tomiyuki Arakawa; Yutaka Uno; Hideaki Ono; Hiromi Takahashi; Kentaro Harase; Hideaki Okayama

doi:10.1117/1.1625679

1 December 2003 Fabrication method of Bragg gratings in silica channel optical waveguides

Tomiyuki Arakawa, Yutaka Uno, Hideaki Ono, Hiromi Takahashi, Kentaro Harase, Hideaki Okayama

Author Affiliations +

Optical Engineering, Vol. 42, Issue 12, (December 2003). https://doi.org/10.1117/1.1625679

Abstract

Strong Bragg gratings are realized in silica channel optical channel waveguides by plasma-enhanced chemical vapor deposition and reactive ion etching. In the gratings, the insertion of 0.2-μm-thick SiO2 layers with a relatively low refractive index between the cores and claddings successfully yields high reflectance, high extinction ratio, and low polarization dependence.

©(2003) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Tomiyuki Arakawa, Yutaka Uno, Hideaki Ono, Hiromi Takahashi, Kentaro Harase, and Hideaki Okayama "Fabrication method of Bragg gratings in silica channel optical waveguides," Optical Engineering 42(12), (1 December 2003). https://doi.org/10.1117/1.1625679

Published: 1 December 2003

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