1 November 2004 Experimental study on the measurement of micro structures
Qingxiang Li, Yuhe Li, Boxiong Wang, Shifu Xue
Author Affiliations +
Abstract
Measurement of micro structures is a key issue in microtechnology, and it will influence the production efficiency and quality of large-scale integrated circuits. An experimental study on the factors affecting the accuracy of measurement of micro structures has been carried out with a laboratory-built DXY-1 type linewidth measuring system. The experiment results show that the repeatability of the system is better than ±0.005 μm, and the difference between the nominal and measured values is less than ±0.02 μm.
©(2004) Society of Photo-Optical Instrumentation Engineers (SPIE)
Qingxiang Li, Yuhe Li, Boxiong Wang, and Shifu Xue "Experimental study on the measurement of micro structures," Optical Engineering 43(11), (1 November 2004). https://doi.org/10.1117/1.1795261
Published: 1 November 2004
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CITATIONS
Cited by 1 scholarly publication.
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KEYWORDS
Microscopes

Diffraction

Imaging systems

Integrated circuits

Silicon

Image processing

Image quality

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