Instrumentation, Measurement, and Metrology

Design and implementation of a vacuum-compatible laser-based subnanometer-resolution absolute distance measurement system

[+] Author Affiliations
Patrick P. Naulleau, Paul E. Denham, Senajith Rekawa

Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720

Opt. Eng. 44(1), 013605 (Dec. 21, 2004). doi:10.1117/1.1830043
History: Received Mar. 1, 2004; Revised Jul. 3, 2004; Accepted Jul. 15, 2004; Dec. 21, 2004; Online December 21, 2004
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We describe the design and implementation of a vacuum compatible laser-based absolute distance measurement system with subnanometer resolution. The presented system is compatible with operation in the 108-Torr range, and with some minor modifications it could be used in the 109-Torr range. The system is based on glancing incidence reflection and dual segmented diode detection. The system has been implemented as a focus sensor for extreme ultraviolet interferometry and microlithography experiments at Lawrence Berkeley National Laboratory’s Advanced Light Source synchrotron radiation facility. A 3σ operational noise floor of 0.78 nm has been demonstrated. © 2005 Society of Photo-Optical Instrumentation Engineers.

© 2005 Society of Photo-Optical Instrumentation Engineers

Citation

Patrick P. Naulleau ; Paul E. Denham and Senajith Rekawa
"Design and implementation of a vacuum-compatible laser-based subnanometer-resolution absolute distance measurement system", Opt. Eng. 44(1), 013605 (Dec. 21, 2004). ; http://dx.doi.org/10.1117/1.1830043


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