Optimization design and manufacturing tolerance analysis of a polymer microring resonant wavelength multiplexer

Chun-Sheng Ma; Xian-Yin Wang; Shu-Lin E; Yuan-Zhe Xu; Xin Yan; Daming Zhang; Zhanchen Cui; De-Gui Sun

doi:10.1117/1.1842777

1 February 2005 Optimization design and manufacturing tolerance analysis of a polymer microring resonant wavelength multiplexer

Chun-Sheng Ma, Xian-Yin Wang, Shu-Lin E, Yuan-Zhe Xu, Xin Yan, Daming Zhang, Zhanchen Cui, De-Gui Sun

Author Affiliations +

Optical Engineering, Vol. 44, Issue 2, 025005 (February 2005). https://doi.org/10.1117/1.1842777

Abstract

Based on formulas presented, optimization design is performed and the effects of manufacturing tolerances on transmission characteristics are analyzed for a polymer microring resonant wavelength multiplexer around the central wavelength of 1.550918 µm with wavelength spacing 1.6 nm. Modeling results show that the insertion loss is less than 0.55 dB and crosstalk is less than –21 dB for each of eight vertical output channels of the designed device without tolerances. Some manufacturing tolerances result in a shift of the transmission spectrum and lead to increases of the inserted loss and crosstalk over the design case without tolerances

©(2005) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Chun-Sheng Ma, Xian-Yin Wang, Shu-Lin E, Yuan-Zhe Xu, Xin Yan, Daming Zhang, Zhanchen Cui, and De-Gui Sun "Optimization design and manufacturing tolerance analysis of a polymer microring resonant wavelength multiplexer," Optical Engineering 44(2), 025005 (1 February 2005). https://doi.org/10.1117/1.1842777

Published: 1 February 2005

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