Special Section on Applications of Laser Ablation and Micromachining

On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses

[+] Author Affiliations
Mark Mero, Benjamin Clapp, Jayesh C. Jasapara, Wolfgang Rudolph

University of New Mexico, Department of Physics and Astronomy, Albuquerque, New Mexico 87131

Detlev Ristau, Kai Starke

Laser Zentrum Hannover e.V., D-30419 Hannover, Germany

Jo¨rg Kru¨ger, Sven Martin, Wolfgang Kautek

Federal Institute for Materials Research and Testing, D-12200 Berlin, Germany

Opt. Eng. 44(5), 051107 (May 10, 2005). doi:10.1117/1.1905343
History: Received Aug. 18, 2004; Revised Nov. 11, 2004; Accepted Dec. 17, 2004; May 10, 2005; Online May 10, 2005
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The physical effects reducing the damage threshold of dielectric films when exposed to multiple femtosecond pulses are investigated. The measured temperature increase of a Ta2O5 film scales exponentially with the pulse fluence. A polarized luminescence signal is observed that depends quadratically on the pulse fluence and is attributed to two-photon excitation of self-trapped excitons that form after band-to-band excitation. The damage fluence decreases with increasing pulse number, but is independent of the repetition rate from 1 Hz to 1 kHz at a constant pulse number. The repetition rate dependence of the breakdown threshold is also measured for TiO2,HfO2,Al2O3, and SiO2 films. A theoretical model is presented that explains these findings. © 2005 Society of Photo-Optical Instrumentation Engineers.

© 2005 Society of Photo-Optical Instrumentation Engineers

Citation

Mark Mero ; Benjamin Clapp ; Jayesh C. Jasapara ; Wolfgang Rudolph ; Detlev Ristau, et al.
"On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses", Opt. Eng. 44(5), 051107 (May 10, 2005). ; http://dx.doi.org/10.1117/1.1905343


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