Elimination of cross-talk in silicon-on-insulator waveguide crossings with optimized angle

Yiyuan Xie; Jiang Xu; Jianguo Zhang

doi:10.1117/1.3593153

1 June 2011 Elimination of cross-talk in silicon-on-insulator waveguide crossings with optimized angle

Yiyuan Xie, Jiang Xu, Jianguo Zhang

Author Affiliations +

Optical Engineering, Vol. 50, Issue 6, 064601 (June 2011). https://doi.org/10.1117/1.3593153

Abstract

We present a low crosstalk, low losses crossings for silicon-on-insulator waveguides by choosing the optimum crossing angle. The waveguides are broadened using a 3 μm parabolic taper in each arm. It is obtained that by using the crossing angles of 60 deg instead of the conventional 90 deg crossing angle, crosstalk losses are improved by more than 3.7 dB without degrading transmission losses. The transmission behavior of the crossing waveguides are illustrated by numerical simulations through the finite difference time domain method. The proposed crossing structure has a high compactness, a broad bandwidth with almost flat transmission losses, and constant crosstalk losses.

©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Yiyuan Xie, Jiang Xu, and Jianguo Zhang "Elimination of cross-talk in silicon-on-insulator waveguide crossings with optimized angle," Optical Engineering 50(6), 064601 (1 June 2011). https://doi.org/10.1117/1.3593153

Published: 1 June 2011

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