Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors

Richard Fu; James Pattison

doi:10.1117/1.OE.51.10.104003

3 October 2012 Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors

Richard Fu, James Pattison

Author Affiliations +

Optical Engineering, Vol. 51, Issue 10, 104003 (October 2012). https://doi.org/10.1117/1.OE.51.10.104003

Abstract

Mercury cadmium telluride (HgCdTe) processing must be performed at a low temperature in order to reduce Hg depletion. To meet demand, low-temperature plasma enhanced atomic layer deposition (PE-ALD) is an emerging deposition technology for highly conformal thin films. We comparatively studied the effectiveness of low-temperature PE-ALD by measuring the ALD film roughness, thickness, and dielectric values. Conformal deposition was investigated through scanning electron microscopy images of the Al₂O₃ film deposited onto high aspect ratio features dry-etched into HgCdTe. PE-ALD demonstrated conformal coatings of trenches, pillars and holes in advanced HgCdTe infrared sensor architectures.

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Richard Fu and James Pattison "Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors," Optical Engineering 51(10), 104003 (3 October 2012). https://doi.org/10.1117/1.OE.51.10.104003

Published: 3 October 2012

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