Instrumentation, Measurement, and Metrology

Alignment method based on matched dual-grating moiré fringe for proximity lithography

[+] Author Affiliations
Jiangping Zhu

Institution of Optics & Electronics, Chinese Academy of Sciences, Chengdu 610209, China

University of Electronic Science and Technology of China, School of Optoelectronic Information, Chengdu 610054, China

Graduate University of Chinese Academy of Sciences, Beijing 100039, China

Song Hu

Institution of Optics & Electronics, Chinese Academy of Sciences, Chengdu 610209, China

Junsheng Yu

University of Electronic Science and Technology of China, School of Optoelectronic Information, Chengdu 610054, China

Yan Tang

Institution of Optics & Electronics, Chinese Academy of Sciences, Chengdu 610209, China

Opt. Eng. 51(11), 113603 (Nov 01, 2012). doi:10.1117/1.OE.51.11.113603
History: Received July 24, 2012; Revised October 7, 2012; Accepted October 10, 2012
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Abstract.  The application of dual-grating moiré fringe is introduced in lithography alignment. Minute angular displacement between the two alignment marks will lead to the tilt of moiré fringe, which has an influence in high-accuracy alignment. Proposed is a novel measurement method of angular displacement based on the phase of moiré fringe. The relationship between phase of moiré fringe and angular displacement is analyzed. Both simulation and experiment indicate that an angular displacement can be determined to achieve a linear displacement measurement with error of nanometer level.

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© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Jiangping Zhu ; Song Hu ; Junsheng Yu and Yan Tang
"Alignment method based on matched dual-grating moiré fringe for proximity lithography", Opt. Eng. 51(11), 113603 (Nov 01, 2012). ; http://dx.doi.org/10.1117/1.OE.51.11.113603


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