Fabrication of large-scale photonic phased array using a holographic lithography system

Shen Shaoxin; Xuechang Ren; Shou Liu; Zhilin Yang; Yuanying Zhang

doi:10.1117/1.OE.52.9.095103

9 September 2013 Fabrication of large-scale photonic phased array using a holographic lithography system

Shen Shaoxin, Xuechang Ren, Shou Liu, Zhilin Yang, Yuanying Zhang

Author Affiliations +

Optical Engineering, Vol. 52, Issue 9, 095103 (September 2013). https://doi.org/10.1117/1.OE.52.9.095103

Abstract

A holographic lithography method for fabricating large-scale photonic phased array is presented. The large-scale array could be generated using a specially designed holographic optical element and the period could be decreased by half with the help of a half-wave plate. This method provides a convenient way to obtain the photonic array with a smaller period without shortening the recording wavelength. matlab simulations and primary experimental results have demonstrated that the phase modulation and nonlinear photoresist response played collectively significant roles in tuning the distribution of the array. The large-scale photonic phased array with a smaller period is an ideal candidate as a Raman substrate.

Citation Download Citation

Shen Shaoxin, Xuechang Ren, Shou Liu, Zhilin Yang, and Yuanying Zhang "Fabrication of large-scale photonic phased array using a holographic lithography system," Optical Engineering 52(9), 095103 (9 September 2013). https://doi.org/10.1117/1.OE.52.9.095103

Published: 9 September 2013

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