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1 October 2005 RETRACTED: Analysis of characteristic parameters of a plasma ion source and of ion-assisted deposited optical thin films
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Abstract
It is well known that ion-assisted deposition (IAD) using a plasma source improves the optical and physical characteristics of optical thin films. A broad-beam cold-cathode plasma source was used in this study. The versatile ion source selected can easily be retrofitted into existing deposition chambers or new installations. This paper discusses characterization of the ions produced by the plasma source and analyzes the properties of thin films produced using the plasma source for IAD. Ion energy measurements were made using an ion energy analyzer for the determination of ion energy distribution functions (IEDFs). IEDFs were measured for three gases; argon, oxygen, and nitrogen. The ion characteristics in oxygen are focused on. The effect of pressure and drive current on the IEDFs of oxygen ions is discussed. Mean ion energies of oxygen as a function of pressure, drive voltage, and drive current were calculated. Since the density and quality of films are related to the ion current density during deposition, the effects of drive voltage, pressure, and the pumping speed of the system are discussed. Characteristics of TiO2 and Ta2O5 films deposited on silicon wafers and microscope slides were investigated. The conditions for moisture stability of these films were analyzed.

The above-listed paper has been removed from the SPIE Digital Library due to the discovery that significant portions of the text, figures, and equations were taken directly, and without proper credit and additional research originality, from the following previously published papers by other researchers:

  1. D. E. Morton and V. Fridman , “Measurement and Correlation of Ion Beam Current Density to Moisture Stability of Oxide Film Stacks Fabricated by Cold Cathode Ion Assisted Deposition," 41st Annual Technical Conference Proceedings, Society of Vacuum Coaters, pp. 297–302 (1998).

  2. O. Zabeida, J. E. Klemberg-Sapieha, L. Martinu, and D. E. Morton, “Ion Bombardment Characteristics During the Growth of Optical Films Using a Cold Cathode Ion Source,” 42nd Annual Technical Conference Proceedings, Society of Vacuum Coaters, pp. 267–272 (1999).

  3. D. E. Morton, “The Effects of Pumping Speed on the Operation of a Cold Cathode Ion Source,” 43rd Annual Technical Conference Proceedings, Society of Vacuum Coaters, pp. 207–211 (2000).

As stated in the SPIE Publication Ethics Guidelines, “SPIE defines plagiarism as the reuse of someone else's prior ideas, processes, results, or words without explicit attribution of the original author and source.... SPIE considers plagiarism in any form to be unacceptable and a serious breach of professional conduct.” Therefore, this paper was removed from the SPIE Digital Library on November 16, 2007. The citations are provided here so that interested readers can access the information from the original sources.

©(2005) Society of Photo-Optical Instrumentation Engineers (SPIE)
Omer Faruk Farsakoglu "RETRACTED: Analysis of characteristic parameters of a plasma ion source and of ion-assisted deposited optical thin films," Optical Engineering 44(10), 103601 (1 October 2005). https://doi.org/10.1117/1.2073747
Published: 1 October 2005
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KEYWORDS
Ions

Refractive index

Plasma

Oxygen

Tantalum

Argon

Thin films

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