Superhydrophobic dual micro- and nanostructures fabricated by direct laser interference lithography

Wenjun Li; Zuobin Wang; Dapeng Wang; Ziang Zhang; Le Zhao; Dayou Li; Renxi Qiu; Carsten R. Maple

doi:10.1117/1.OE.53.3.034109

27 March 2014 Superhydrophobic dual micro- and nanostructures fabricated by direct laser interference lithography

Wenjun Li, Zuobin Wang, Dapeng Wang, Ziang Zhang, Le Zhao, Dayou Li, Renxi Qiu, Carsten R. Maple

Author Affiliations +

Optical Engineering, Vol. 53, Issue 3, 034109 (March 2014). https://doi.org/10.1117/1.OE.53.3.034109

Abstract

A method for the fabrication of highly ordered superhydrophobic dual micro- and nanostructures on silicon by direct laser interference lithography (LIL) is presented. The method offers its innovation that the superhydrophobic dual micro- and nanostructures can be fabricated directly by controlling the process of four-beam laser interference and the use of hydrofluoric acid (HF) to wipe off the silica generated during the process. Different laser fluences, exposure durations, and cleanout times have been investigated to obtain the optimum value of the contact angle (CA). The superhydrophobic surface with the CA of 153.2 deg was achieved after exposure of 60 s and immersion in HF with a concentration of 5% for 3 min. Compared with other approaches, it is a facile and efficient method with its significant feature for the macroscale fabrication of highly ordered superhydrophobic dual micro- and nanostructures on silicon.

Citation Download Citation

Wenjun Li, Zuobin Wang, Dapeng Wang, Ziang Zhang, Le Zhao, Dayou Li, Renxi Qiu, and Carsten R. Maple "Superhydrophobic dual micro- and nanostructures fabricated by direct laser interference lithography," Optical Engineering 53(3), 034109 (27 March 2014). https://doi.org/10.1117/1.OE.53.3.034109

Published: 27 March 2014

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