Special Section on High-Speed 3-D Optical Metrology and Applications

Statistical patterns: an approach for high-speed and high-accuracy shape measurements

[+] Author Affiliations
Martin Schaffer

EnShape—Startup of the Friedrich Schiller University Jena, Fröbelstieg 1, 07743 Jena, Germany

Marcus Große

EnShape—Startup of the Friedrich Schiller University Jena, Fröbelstieg 1, 07743 Jena, Germany

Bastian Harendt

Friedrich Schiller University Jena, Abbe Center of Photonics, Institute of Applied Optics, Fröbelstieg 1, 07743 Jena, Germany

Richard Kowarschik

Friedrich Schiller University Jena, Abbe Center of Photonics, Institute of Applied Optics, Fröbelstieg 1, 07743 Jena, Germany

Opt. Eng. 53(11), 112205 (Apr 29, 2014). doi:10.1117/1.OE.53.11.112205
History: Received February 1, 2014; Revised February 26, 2014; Accepted February 26, 2014
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Abstract.  Statistical patterns have been used for structured illumination within a stereo-photogrammetry setup to precisely measure the shape of nearly arbitrary objects in a short time. This contribution gives an overview of recently developed projection setups based on such statistical patterns. Coherent and incoherent approaches as well as the applied reconstruction algorithm are explained. The results show the suitability of the statistical pattern projection approach to replace the commonly used slow digital light processing (DLP) projectors of three-dimensional shape sensors and facilitate measurements in an ultrashort time frame (microsecond range), e.g., to track moving objects.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Martin Schaffer ; Marcus Große ; Bastian Harendt and Richard Kowarschik
"Statistical patterns: an approach for high-speed and high-accuracy shape measurements", Opt. Eng. 53(11), 112205 (Apr 29, 2014). ; http://dx.doi.org/10.1117/1.OE.53.11.112205


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