Special Section on Laser Damage II

Effect of etching on the laser-induced damage properties of artificial defects under 1064-nm laser irradiation

[+] Author Affiliations
Menglei Lu

Key Laboratory of Advanced Microstructure Materials, Ministry of Education, Shanghai 200092, China

Tongji University, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Shanghai 200092, China

Bin Ma, Guangda Zhan, Hongfei Jiao, Xinbin Cheng

Key Laboratory of Advanced Microstructure Materials, Ministry of Education, Shanghai 200092, China

Tongji University, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Shanghai 200092, China

Opt. Eng. 53(12), 122505 (Jul 01, 2014). doi:10.1117/1.OE.53.12.122505
History: Received March 31, 2014; Revised May 19, 2014; Accepted June 3, 2014
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Abstract.  The cracks and scratches inevitably generated by previous grinding and polishing significantly lower the ability of laser resistance of optical substrates. In this study, the artificial indentations, scratches, and structural defects imbedded with metal nanoparticles are fabricated. The laser-induced damage characteristics of such defects in different types and sizes are investigated qualitatively and quantitatively under 1064-nm laser irradiation. Moreover, the etching effect on improving the laser-induced damage threshold (LIDT) of artificial defects under different etching conditions is analyzed. LIDT is then evaluated according to the etching depth and the morphologies of artificial defects.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Menglei Lu ; Bin Ma ; Guangda Zhan ; Hongfei Jiao and Xinbin Cheng
"Effect of etching on the laser-induced damage properties of artificial defects under 1064-nm laser irradiation", Opt. Eng. 53(12), 122505 (Jul 01, 2014). ; http://dx.doi.org/10.1117/1.OE.53.12.122505


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