Optical Design and Engineering

Efficiently approximate method for near field uniformity evaluation of finite-sized multilayered dielectric plates

[+] Author Affiliations
Yi Tian

Beijing Institute of Technology, School of Opto-electronics, No. 5, ZhongGuancun South Street, Beijing 100081, China

Shanghai Institute of Electro-mechanical Engineering, Shanghai 201109, China

Beijing Key Laboratory for Precision Optoelectronic Measurement Instrument and Technology, Beijing 100081, China

Hui Yan, Xin Wang, Zhuo Li

Beijing Institute of Technology, School of Opto-electronics, No. 5, ZhongGuancun South Street, Beijing 100081, China

Beijing Key Laboratory for Precision Optoelectronic Measurement Instrument and Technology, Beijing 100081, China

Li Zhang

Shanghai Institute of Electro-mechanical Engineering, Shanghai 201109, China

Opt. Eng. 54(2), 025109 (Feb 12, 2015). doi:10.1117/1.OE.54.2.025109
History: Received November 9, 2014; Accepted January 19, 2015
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Abstract.  A method for joint transmission line and aperture field integration (TL-AFIM) is proposed and utilized to efficiently compute the near-field distribution of the finite-sized multilayered dielectric plates. Four indicators Epv, Erms, φpv, and φrms representing the amplitude and phase variations are proposed to evaluate the near-field uniformity. A multilayered dielectric plate containing three dielectric layers is analyzed and evaluated by TL-AFIM. Compared to the commonly used multilevel fast multipole method (MLFMM), the memory requirement and CPU time consumption are drastically reduced from 61.3 GB and 20.2 h to 4.4 MB and 2.5 s, respectively. The calculation accuracy is better than 90%.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Yi Tian ; Hui Yan ; Xin Wang ; Li Zhang and Zhuo Li
"Efficiently approximate method for near field uniformity evaluation of finite-sized multilayered dielectric plates", Opt. Eng. 54(2), 025109 (Feb 12, 2015). ; http://dx.doi.org/10.1117/1.OE.54.2.025109


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