Instrumentation, Techniques, and Measurement

Straightforward technique for in situ imaging of spin-coated thin films

[+] Author Affiliations
Daniel T. W. Toolan

University of Sheffield, Department of Chemical and Biological Engineering, Mappin Street, Sheffield S1 3JD, United Kingdom

Opt. Eng. 54(2), 024109 (Feb 24, 2015). doi:10.1117/1.OE.54.2.024109
History: Received December 7, 2014; Accepted January 28, 2015
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Abstract.  Spin-coating provides a facile method for the production of highly uniform thin films that have applications as photoresists, coatings, and in organic electronics. Due to the rapid high-speed nature of spin-coating, obtaining data in situ has proved problematic. Recently, a number of in situ characterization techniques have provided new insights into the processes occurring during spin-coating. This paper demonstrates a straightforward method for obtaining in situ optical reflectance images during spin-coating that provide insights into film thinning dynamics, the origins of surface inhomogeneities caused by contaminated substrates, and crystallization processes. This technique could be easily implemented industrially and in many laboratories and will allow for a better understanding of the spin-coating process.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Daniel T. W. Toolan
"Straightforward technique for in situ imaging of spin-coated thin films", Opt. Eng. 54(2), 024109 (Feb 24, 2015). ; http://dx.doi.org/10.1117/1.OE.54.2.024109


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