Optical Design and Engineering

Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrological applications

[+] Author Affiliations
Zdenko Zápražný, Dušan Korytár, Edmund Dobročka

Slovak Academy of Sciences, Institute of Electrical Engineering, Dúbravská cesta 9, 845 11 Bratislava, Slovakia

Matej Jergel, Peter Šiffalovič

Slovak Academy of Sciences, Institute of Physics, Dúbravská cesta 9, 845 11 Bratislava, Slovakia

Patrik Vagovič

DESY, Center for Free-Electron Laser Science, Notkestrasse 85, 226 07 Hamburg, Germany

Claudio Ferrari

CNR-IMEM Institute, Parco Area delle Scienze 37/A, 431 24 Parma, Italy

Petr Mikulík

Masaryk University, Central European Institute of Technology, Kotlářska 2, 611 37 Brno, Czech Republic

Maksym Demydenko

Slovak Academy of Sciences, Institute of Physics, Dúbravská cesta 9, 845 11 Bratislava, Slovakia

Sumy State University, R.-Korsakov Str. 2, 40007 Sumy, Ukraine

Marek Mikloška

Integra TDS, s.r.o., Pod Párovcami 4757/25, 921 01 Piešt’any, Slovakia

Opt. Eng. 54(3), 035101 (Mar 02, 2015). doi:10.1117/1.OE.54.3.035101
History: Received September 10, 2014; Accepted January 19, 2015
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Abstract.  We present the numerical optimization and the technological development progress of x-ray optics based on asymmetric germanium crystals. We show the results of several basic calculations of diffraction properties of germanium x-ray crystal monochromators and of an analyzer-based imaging method for various asymmetry factors using an x-ray energy range from 8 to 20 keV. The important parameter of highly asymmetric monochromators as image magnifiers or compressors is the crystal surface quality. We have applied several crystal surface finishing methods, including advanced nanomachining using single-point diamond turning (SPDT), conventional mechanical lapping, chemical polishing, and chemomechanical polishing, and we have evaluated these methods by means of atomic force microscopy, diffractometry, reciprocal space mapping, and others. Our goal is to exclude the chemical etching methods as the final processing technique because it causes surface undulations. The aim is to implement very precise deterministic methods with a control of surface roughness down to 0.1 nm. The smallest roughness (0.3nm), best planarity, and absence of the subsurface damage were observed for the sample which was machined using an SPDT with a feed rate of 1mm/min and was consequently polished using a fine polishing 15-min process with a solution containing SiO2 nanoparticles (20 nm).

© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Zdenko Zápražný ; Dušan Korytár ; Matej Jergel ; Peter Šiffalovič ; Edmund Dobročka, et al.
"Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrological applications", Opt. Eng. 54(3), 035101 (Mar 02, 2015). ; http://dx.doi.org/10.1117/1.OE.54.3.035101


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