Optical Design and Engineering

Fabrication error analysis for diffractive optical elements used in a lithography illumination system

[+] Author Affiliations
Jian Wang, Fang Zhang, Qiang Song

Shanghai Institute of Optics and Fine Mechanics, Lab of Information Optics and Optoelectronic Technology, Chinese Academy of Sciences, No. 390 Qinghe Road, Jiading District, Shanghai 201800, China

University of the Chinese Academy of Sciences, No. 19 Yuquan Road, Shijingshan District, Beijing 100049, China

Aijun Zeng, Jing Zhu, Huijie Huang

Shanghai Institute of Optics and Fine Mechanics, Lab of Information Optics and Optoelectronic Technology, Chinese Academy of Sciences, No. 390 Qinghe Road, Jiading District, Shanghai 201800, China

Opt. Eng. 54(4), 045102 (Apr 13, 2015). doi:10.1117/1.OE.54.4.045102
History: Received December 30, 2014; Accepted March 24, 2015
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Abstract.  With the constant shrinking of printable critical dimensions in photolithography, off-axis illumination (OAI) becomes one of the effective resolution-enhancement methods facing these challenges. This, in turn, is driving much more strict requirements, such as higher diffractive efficiency of the diffractive optical elements (DOEs) used in the OAI system. Since the design algorithms to optimize DOEs’ phase profile are improved, the fabrication process becomes the main limiting factor leading to energy loss. Tolerance analysis is the general method to evaluate the fabrication accuracy requirement, which is especially useful for highly specialized deep UV applications with small structures and tight tolerances. A subpixel DOE simulation model is applied for tolerance analysis of DOEs by converting the abstractive fabrication structure errors into quantifiable subpixel phase matrices. Adopting the proposed model, four kinds of fabrication errors including misetch, misalignment, feature size error, and feature rounding error are able to be investigated. In the simulation experiments, systematic fabrication error studies of five typical DOEs used in 90-nm scanning photolithography illumination system are carried out. These results are valuable in the range of high precision DOE design algorithm and fabrication process optimization.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Jian Wang ; Fang Zhang ; Qiang Song ; Aijun Zeng ; Jing Zhu, et al.
"Fabrication error analysis for diffractive optical elements used in a lithography illumination system", Opt. Eng. 54(4), 045102 (Apr 13, 2015). ; http://dx.doi.org/10.1117/1.OE.54.4.045102


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