Optical Design and Engineering

Radial-quality uniformity investigations of large-area thick Al films

[+] Author Affiliations
Haigui Yang, Xiaoyi Wang, Zhenfeng Shen, Shanwen Zhang

Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Key Laboratory of Optical System Advanced Manufacturing Technology, Dong Nanhu Road 3888, Changchun 130033, China

Zizheng Li, Jinsong Gao

Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Key Laboratory of Optical System Advanced Manufacturing Technology, Dong Nanhu Road 3888, Changchun 130033, China

University of Chinese Academy of Sciences, Daheng Academy, Yuquan Road 19A, Beijing 100039, China

Opt. Eng. 54(4), 045106 (Apr 28, 2015). doi:10.1117/1.OE.54.4.045106
History: Received January 19, 2015; Accepted April 7, 2015
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Abstract.  The fabrication of high-quality large-area thick Al films with a thickness around 10μm or even more is one of the most important factors to realize high-performance large-size echelle gratings. During the deposition process of large-area Al films, Al film quality generally exhibits a different behavior along the radius (R) direction, which seriously affects the performance of echelle gratings. In this study, for the first time, we investigate the radial-quality uniformity of large-area (R=400mm) thick (>10μm) Al films in detail. We not only analyze the radial-quality difference of Al films prepared by the traditional electron-beam evaporation process, but also significantly improve the radial-quality uniformity of large-area thick Al films by using a coevaporation process. By comparing two kinds of film coating processes, we clarify the origin of the radial-quality difference of Al films, and prepare large-area thick Al films with excellent radial-quality uniformity.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Haigui Yang ; Zizheng Li ; Xiaoyi Wang ; Zhenfeng Shen ; Jinsong Gao, et al.
"Radial-quality uniformity investigations of large-area thick Al films", Opt. Eng. 54(4), 045106 (Apr 28, 2015). ; http://dx.doi.org/10.1117/1.OE.54.4.045106


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