Optical Design and Engineering

Origin and distribution of redeposition layer in polished fused silica

[+] Author Affiliations
Zhuo Wang, YuJun Cao, JunHong Yang, Li Tang, ShengYi Li

National University of Defense Technology, College of Mechatronic Engineering and Automation, Deya Road, Changsha 410073, China

Lin Wang

Anhui University, School of Life Science, Jiulong Road, Hefei 230601, China

WenQiang Peng

National University of Defense Technology, College of Mechatronic Engineering and Automation, Deya Road, Changsha 410073, China

National University of Defense Technology, College of Basic Education, Deya Road, Changsha 410073, China

Opt. Eng. 54(8), 085102 (Aug 07, 2015). doi:10.1117/1.OE.54.8.085102
History: Received May 26, 2015; Accepted July 6, 2015
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Abstract.  Subsurface damage, especially photoactive impurities embedded in the redeposition layer, degrades the performance of high-energy optics in UV or high-power laser systems. The features and distributions of the redeposition layer in classical and magnetorheological finishing polished fused silica were detected and evaluated by a variety of measurements, such as secondary ion mass spectroanalyzer, atomic force microscope, scanning electron microscope, and x-ray photoelectron spectroscopy. Then, a critical particle Reynolds number approach and chemical contribution were applied to interpret the deposition mechanism of impurities, on the basis of which a comprehensive redeposition model of polished optics was presented. Eventually, the relationship between distributions of redeposition materials in depth and freshly polished surface structure was investigated. Results show that the redeposition process of nanoparticles is dominated with the particle Reynolds number and the formation of a CeOSi bond. The impurities in the redeposition layer are mixed with removed glass and present as a uniform dopant. Furthermore, there exists explicit correlation between redeposition layer and subsurface defected layer; so it is easy to achieve planarized surface in the polishing process.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Zhuo Wang ; Lin Wang ; WenQiang Peng ; YuJun Cao ; JunHong Yang, et al.
"Origin and distribution of redeposition layer in polished fused silica", Opt. Eng. 54(8), 085102 (Aug 07, 2015). ; http://dx.doi.org/10.1117/1.OE.54.8.085102


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