Materials, Photonic Devices, and Sensors

Photomechanical ablation in obsidianus lapis via Q-switched 1064-nm laser energy

[+] Author Affiliations
Alfredo I. Aguilar-Morales, Jose A. Álvarez-Chávez, Angel D. J. Morales-Ramirez

Centro de Investigacion e Innovacion Tecnologica-IPN, Cerrada CECATI s/n Col. Santa Catarina C.P. 02250, Mexico

Michael Panzner, Moises A. Ortega-Delgado

Fraunhofer-Institut für Werkstoff und Strahltechnik IWS, Winterbergstrasse 28, Dresden 01277, Germany

Luis M. Rosales-Olivares

Instituto Nacional de Rehabilitacion, Calz. Mexico-Xochimilco 289 Col. Arenal de Guadalupe C.P.14389, Mexico

Opt. Eng. 54(9), 097101 (Sep 10, 2015). doi:10.1117/1.OE.54.9.097101
History: Received April 16, 2015; Accepted July 24, 2015
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Abstract.  The process of ablation in obsidianus lapis is mainly governed by pulse energy from the laser source and scanning speed. The rate of material ablation is influenced by chemical and physical properties. In this work, laser energy at 1064 nm has been used for ablation behavior in a Q-switch regime. A >40W average power Nd:YAG source with pulse energies ranging from 3 mJ to nearly 7 mJ, achieved surface damages up to 160μm of depth. Photomechanical ablation in terms of scan speed showed a maximum depth of nearly 500μm at 130mm/s. The maximum pulse energy of 12 mJ resulted in the ablation of 170-μm depth. Highly efficient ablation in obsidianus lapis for artistic work is an interesting field of application.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Alfredo I. Aguilar-Morales ; Jose A. Álvarez-Chávez ; Angel D. J. Morales-Ramirez ; Michael Panzner ; Moises A. Ortega-Delgado, et al.
"Photomechanical ablation in obsidianus lapis via Q-switched 1064-nm laser energy", Opt. Eng. 54(9), 097101 (Sep 10, 2015). ; http://dx.doi.org/10.1117/1.OE.54.9.097101


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