Calibrating the pupil fill balance for hypernumerical aperture lithographic objective

Dawei Rui; Wei Zhang; Huaijiang Yang

doi:10.1117/1.OE.54.9.095103

21 September 2015 Calibrating the pupil fill balance for hypernumerical aperture lithographic objective

Dawei Rui, Wei Zhang, Huaijiang Yang

Author Affiliations +

Optical Engineering, Vol. 54, Issue 9, 095103 (September 2015). https://doi.org/10.1117/1.OE.54.9.095103

Abstract

Projection objectives for deep-ultraviolet lithography typically have a dual-telecentric design, and the telecentricity in object space (mask) is idealized as zero. However, for combined illumination and objective lens systems, telecentricity matching on mask can result in a dramatic change in the pupil intensity distribution. Here, we propose a method of identifying the impact of the mismatch on the pupil fill and decoupling the pupil intensity balance from the telecentricity modulation. The technique is implemented in a user-defined program, and a series of simulations for a hypernumerical aperture immersion objective under off-axis illumination conditions verifies the method.

Citation Download Citation

Dawei Rui, Wei Zhang, and Huaijiang Yang "Calibrating the pupil fill balance for hypernumerical aperture lithographic objective," Optical Engineering 54(9), 095103 (21 September 2015). https://doi.org/10.1117/1.OE.54.9.095103

Published: 21 September 2015

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