Optical Design and Engineering

Fabrication of multilevel resist patterns by using a liquid crystal mask

[+] Author Affiliations
Piotr Słupski, Michał Nikodem, Katarzyna Komorowska

Wroclawskie Centrum Badan EIT+, 147 Stablowicka Street, 54-066 Wroclaw, Poland

Liming Chai

SUSS MicroTec Lithography GmbH, Schleißheimer Street 90, 85748 Garching, Germany

Opt. Eng. 54(11), 115107 (Nov 16, 2015). doi:10.1117/1.OE.54.11.115107
History: Received May 24, 2015; Accepted October 20, 2015
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Abstract.  Photolithographic processes of multilevel features in microfluidics can be complex and expensive. This paper demonstrates a quick method for manufacturing multilevel patterns, which is based on liquid crystal display masking during a standard lithography process for master mold fabrication for the polydimethysiloxane replica process. An active mask, based on a liquid crystal display, can simplify the process due to the ability to quickly modify designs and reduce the overhead for alignment between mask levels. The possibility of multilevel patterning, with the help of active masking, creates new opportunities for optical lithography processes. We have developed the process for a standard, mercury lamp exposure mask aligner system. The patterning characteristics were evaluated with a step pattern fabricated as an example of three-dimensional patterning for multilevel structuring. The application of a liquid crystal mask for resist contrast measurements was demonstrated.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Piotr Słupski ; Michał Nikodem ; Liming Chai and Katarzyna Komorowska
"Fabrication of multilevel resist patterns by using a liquid crystal mask", Opt. Eng. 54(11), 115107 (Nov 16, 2015). ; http://dx.doi.org/10.1117/1.OE.54.11.115107


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