Optical Design and Engineering

Simulating semiconductor structures for next-generation optical inspection technologies

[+] Author Affiliations
Ori Golani, Ido Dolev

Applied Materials Israel, Oppenheimer Street 9, Rehovot 76701, Israel

James Pond, Jens Niegemann

Lumerical Solutions, Inc., 535 Thurlow Street, Vancouver BC V6E 3L2, Canada

Opt. Eng. 55(2), 025102 (Feb 02, 2016). doi:10.1117/1.OE.55.2.025102
History: Received October 22, 2015; Accepted January 7, 2016
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Abstract.  We present a technique for optimizing advanced optical imaging methods for nanoscale structures, such as those encountered in the inspection of cutting-edge semiconductor devices. The optimization flow is divided to two parts: simulating light-structure interaction using the finite-difference time-domain (FDTD) method and simulating the optical imaging system by means of its optical transfer function. As a case study, FDTD is used to simulate 10-nm silicon line-space and static random-access memory patterns, with irregular structural protrusions and silicon-oxide particles as defects of interest. An ultraviolet scanning-spot optical microscope is used to detect these defects, and the optimization flow is used to find the optimal imaging mode for detection.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Ori Golani ; Ido Dolev ; James Pond and Jens Niegemann
"Simulating semiconductor structures for next-generation optical inspection technologies", Opt. Eng. 55(2), 025102 (Feb 02, 2016). ; http://dx.doi.org/10.1117/1.OE.55.2.025102


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