Instrumentation, Techniques, and Measurement

Automatic inspection of a residual resist layer by means of self-organizing map

[+] Author Affiliations
Zaki Sabit Fawzi Philippe

Laboratoire Hubert Curien—Centre National de la Recherche Scientifique Unité Mixte de Recherche 5516, Batiment F, 18 Rue Professeur Benoît Lauras, Saint Etienne 42000, France

Laboratoire des Technologies de l'Information et de la Communication—Institut Universitaire des Sciences et Techniques d'Abéché, BP 6077 Ndjamena, Chad

Stéphane Robert, Bernard Bayard

Laboratoire Hubert Curien—Centre National de la Recherche Scientifique Unité Mixte de Recherche 5516, Batiment F, 18 Rue Professeur Benoît Lauras, Saint Etienne 42000, France

Opt. Eng. 55(5), 054106 (May 26, 2016). doi:10.1117/1.OE.55.5.054106
History: Received August 19, 2015; Accepted April 29, 2016
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Abstract.  Photolithography allows large-scale fabrication of nanocomponents in the semiconductor industry. This technique consists of manufacturing a desired pattern on a photoresist film transferred onto the substrate during the etching process. Therefore, the mask quality is essential for reliable etching. For example, the presence of a residual layer of resist might be considered as a mask defect and can lead to the failure of the etching process. We propose the use of a Kohonen self-organizing map for automatic detection of a residual layer from an ellipsometric signature. The feasibility of the suggested inspection by the use of a classification technique is discussed and simulations are carried out on a 750-nm period grating.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Zaki Sabit Fawzi Philippe ; Stéphane Robert and Bernard Bayard
"Automatic inspection of a residual resist layer by means of self-organizing map", Opt. Eng. 55(5), 054106 (May 26, 2016). ; http://dx.doi.org/10.1117/1.OE.55.5.054106


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