Special Section on Laser Damage III

Improving the laser-induced damage threshold of 532-nm antireflection coating using plasma ion cleaning

[+] Author Affiliations
Meiping Zhu, Kui Yi, Jian Sun, Jianguo Wang, Jianda Shao

Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Key Laboratory of Materials for High Power Laser, No. 390, Qinghe Road, Jiading District, Shanghai 201800, China

Huanbin Xing, Yingjie Chai

Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Key Laboratory of Materials for High Power Laser, No. 390, Qinghe Road, Jiading District, Shanghai 201800, China

University of Chinese Academy of Sciences, No. 19 A, Yuquan Road, Shijingshan District, Beijing 100049, China

Opt. Eng. 56(1), 011003 (Jul 11, 2016). doi:10.1117/1.OE.56.1.011003
History: Received March 22, 2016; Accepted June 16, 2016
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Abstract.  BK7 glass substrates were precleaned by different cleaning procedures before being loaded into a vacuum chamber, and then a series of plasma ion cleaning procedures were conducted at different bias voltages in the vacuum chamber, prior to the deposition of 532-nm antireflection (AR) coatings. The plasma ion cleaning process was implemented by the plasma ion bombardment from an advanced plasma source. The surface morphology of the plasma ion-cleaned substrate, as well as the laser-induced damage threshold (LIDT) of the 532-nm AR coating was investigated. The results indicated that the LIDT of 532-nm AR coating can be greatly influenced by the plasma ion cleaning energy. The plasma ion cleaning with lower energy is an attractive method to improve the LIDT of the 532-nm AR coating, due to the removal of the adsorbed contaminations on the substrate surface, as well as the removal of part of the chemical impurities hidden in the surface layer.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Meiping Zhu ; Huanbin Xing ; Yingjie Chai ; Kui Yi ; Jian Sun, et al.
"Improving the laser-induced damage threshold of 532-nm antireflection coating using plasma ion cleaning", Opt. Eng. 56(1), 011003 (Jul 11, 2016). ; http://dx.doi.org/10.1117/1.OE.56.1.011003


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