Retardation of sol–gel titanium oxide with imprinted grating structure

Itsunari Yamada; Yoshiro Ishihara; Tsuyoshi Akiyama

doi:10.1117/1.OE.56.1.017108

25 January 2017 Retardation of sol–gel titanium oxide with imprinted grating structure

Itsunari Yamada, Yoshiro Ishihara, Tsuyoshi Akiyama

Author Affiliations +

Optical Engineering, Vol. 56, Issue 1, 017108 (January 2017). https://doi.org/10.1117/1.OE.56.1.017108

Abstract

We fabricated a titanium oxide grating using an imprinting technique and a sol–gel method and evaluated phase retardation. A titanium oxide grating with 75 nm depth, fill factor of 0.3, and 400 nm period was obtained by imprinting a titanium oxide sol solution on a silicone (polydimethylsiloxane; PDMS) mold at 150°C. As a result of phase retardation evaluation, it reached 9.2 deg at the 532-nm wavelength.

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Itsunari Yamada, Yoshiro Ishihara, and Tsuyoshi Akiyama "Retardation of sol–gel titanium oxide with imprinted grating structure," Optical Engineering 56(1), 017108 (25 January 2017). https://doi.org/10.1117/1.OE.56.1.017108

Received: 13 October 2016; Accepted: 4 January 2017; Published: 25 January 2017

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