Materials, Photonic Devices, and Sensors

Retardation of sol–gel titanium oxide with imprinted grating structure

[+] Author Affiliations
Itsunari Yamada

University of Shiga Prefecture, Department of Electronic Systems Engineering, School of Engineering, Hikone, Shiga, Japan

University of Shiga Prefecture, Center for Glass Science and Technology, School of Engineering, Hikone, Shiga, Japan

Yoshiro Ishihara

University of Shiga Prefecture, Department of Electronic Systems Engineering, School of Engineering, Hikone, Shiga, Japan

Tsuyoshi Akiyama

University of Shiga Prefecture, Department of Materials Science, School of Engineering, Hikone, Shiga, Japan

Opt. Eng. 56(1), 017108 (Jan 25, 2017). doi:10.1117/1.OE.56.1.017108
History: Received October 13, 2016; Accepted January 4, 2017
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Abstract.  We fabricated a titanium oxide grating using an imprinting technique and a sol–gel method and evaluated phase retardation. A titanium oxide grating with 75 nm depth, fill factor of 0.3, and 400 nm period was obtained by imprinting a titanium oxide sol solution on a silicone (polydimethylsiloxane; PDMS) mold at 150°C. As a result of phase retardation evaluation, it reached 9.2 deg at the 532-nm wavelength.

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© 2017 Society of Photo-Optical Instrumentation Engineers

Citation

Itsunari Yamada ; Yoshiro Ishihara and Tsuyoshi Akiyama
"Retardation of sol–gel titanium oxide with imprinted grating structure", Opt. Eng. 56(1), 017108 (Jan 25, 2017). ; http://dx.doi.org/10.1117/1.OE.56.1.017108


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