Optical Design and Engineering

Effects of sputtering parameters and separator plates on the structure and stress of W/Si multilayers in x-ray telescope applications

[+] Author Affiliations
Runze Qi, Qiushi Huang, Yang Yang, Zhong Zhang, Zhanshan Wang

Tongji University, Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Shanghai, China

Opt. Eng. 56(3), 035103 (Mar 09, 2017). doi:10.1117/1.OE.56.3.035103
History: Received November 17, 2016; Accepted February 17, 2017
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Abstract.  To develop an x-ray focusing telescope for the Chinese x-ray timing and polarization mission, W/Si multilayers were fabricated using a dedicated cylindrical deposition facility with direct current magnetron sputtering technique. To reduce the interface width of the multilayers, separator plates were mounted at both sides of the substrates to collimate the sputtering particles. The average interface width was reduced from 1.03 nm (without separator plates) to 0.29 nm (with separator plates) for a W/Si multilayer with a 3.8-nm d-spacing. To achieve a high reflectivity multilayer mirror with low stress, the effects of different background and working gas pressures on periodic multilayers during the deposition process were studied. The stress of the W/Si multilayer (d=3.8  nm) slightly increased from 294 to 358  MPa as the background pressure increased from 4×105  Pa to 8×104  Pa and the first-order Bragg peak reflectivity at 8.04 keV (λ=0.154  nm) decreased from 68% to 54%. As the working pressure increased from 0.4 to 0.8 Pa, the stress of the W/Si multilayer significantly changed from 306 to 100 MPa. However, the first-order reflectivity also decreased dramatically from 67% to 8%, and the average interface width increased from 0.29 to 1.2 nm.

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© 2017 Society of Photo-Optical Instrumentation Engineers

Citation

Runze Qi ; Qiushi Huang ; Yang Yang ; Zhong Zhang and Zhanshan Wang
"Effects of sputtering parameters and separator plates on the structure and stress of W/Si multilayers in x-ray telescope applications", Opt. Eng. 56(3), 035103 (Mar 09, 2017). ; http://dx.doi.org/10.1117/1.OE.56.3.035103


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