This paper presents the validation of the design of a 6-in. dual-wavelength transmission sphere (TS) based on the Fizeau interferometer. The TS was verified at a wavelength of 632.8 nm and is compatible for measuring the transmitted wavefront error of an i-line lithography lens. The achromatic design is imperative for a dual wavelength TS and requires more lenses for correcting the chromatic focal shift. Because the overall weight of the TS should be controlled within the load range of the piezoelectric transducers of the interferometer, the fabrication and mounting of lenses with high aspect ratios are challengeable. The mounting of the reference surface based on three-point mounting was successful for the residual reference wavefront error under peak-to-valley (PV) . Furthermore, the reference wavefront is typically restricted within PV to avoid distorted interference fringes. Therefore, we built a double-pass interferometer model for tolerance analysis, and the error budget facilitated decision-making regarding the suitable specifications of lens manufacturing and assembly for cost efficiency. The test results demonstrated that the deformation of the reference wavefront and the residual reference wavefront error met the critical specification at 632.8 nm and that the achromatic TS is compatible for measuring i-line lithography lenses.