Optical Design and Engineering

Performance limits of binary annular phase masks codesigned for depth-of-field extension

[+] Author Affiliations
Rafael Falcón, François Goudail, Caroline Kulcsár, Hervé Sauer

Université Paris-Saclay, CNRS, Institut d’Optique Graduate School, Laboratoire Charles Fabry, Palaiseau Cedex, France

Opt. Eng. 56(6), 065104 (Jun 29, 2017). doi:10.1117/1.OE.56.6.065104
History: Received November 8, 2016; Accepted June 7, 2017
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Abstract.  We investigate the performance limits of hybrid imaging systems including annular binary phase masks optimized for depth-of-field (DoF) extension, as a function of the number of rings and the desired DoF range. The mask parameters are optimized taking into account deconvolution of the acquired raw image in the expression of the global performance of the imaging system. We prove that masks with a limited number of rings are sufficient to obtain near-optimal performance. Moreover, the best achievable image quality decreases as the required DoF range increases, so that for a given required image quality, the DoF extension reachable with binary phase masks is bounded. Finally, these conclusions are shown to be robust against different optical system aberrations and models of scene power spectral density. These results are important in practice to decide if annular binary phase masks are the relevant solution for a given imaging problem and for mask manufacturing, since the number and thickness of the rings reachable at affordable cost by technology are generally limited.

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© 2017 Society of Photo-Optical Instrumentation Engineers

Citation

Rafael Falcón ; François Goudail ; Caroline Kulcsár and Hervé Sauer
"Performance limits of binary annular phase masks codesigned for depth-of-field extension", Opt. Eng. 56(6), 065104 (Jun 29, 2017). ; http://dx.doi.org/10.1117/1.OE.56.6.065104


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