Plasma Deposition Of Integrated Optical Waveguides

N Nourshargh; E M Starr; J S McCormack

doi:10.1117/12.950753

11 September 1985 Plasma Deposition Of Integrated Optical Waveguides

N Nourshargh, E M Starr, J S McCormack

Proceedings Volume 0578, Integrated Optical Circuit Engineering II; (1985) https://doi.org/10.1117/12.950753
Event: 1985 Cambridge Symposium, 1985, Cambridge, United States

Abstract

A plasma activated chemical vapour deposition (CVD) technique is described for fabricating doped silica optical waveguides on silica substrates. Planar, germania doped, silica waveguides have been fabricated with less than 0.3 dB/cm attenuation at λ = 0.633 μm. There is considerable scope for reducing the attenuation much further. Waveguide depositions are normally carried out at 1100°C but guiding films have also been deposited at room temperature.

Citation Download Citation

N Nourshargh, E M Starr, and J S McCormack "Plasma Deposition Of Integrated Optical Waveguides", Proc. SPIE 0578, Integrated Optical Circuit Engineering II, (11 September 1985); https://doi.org/10.1117/12.950753

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