A Glimpse Into The Future Of Optical Lithography

Harry L. Stover

doi:10.1117/12.963696

20 August 1986 A Glimpse Into The Future Of Optical Lithography

Harry L. Stover

Proceedings Volume 0633, Optical Microlithography V; (1986) https://doi.org/10.1117/12.963696
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

The conference papers relating to resolution and overlay of exploratory but production-worthy exposure/alignment systems indicate performance far exceeding current IC manufacturing demands, and hence give a glimpse of future production systems and design rules. A summary table is presented.

Citation Download Citation

Harry L. Stover "A Glimpse Into The Future Of Optical Lithography", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); https://doi.org/10.1117/12.963696

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