Clear Defect Photolithographic Mask Repair In Open Air Using Laser-Induced Pyrolytic Decomposition

Zbigniew Drozdowicz; Joel Bornstein; John O'Connor

doi:10.1117/12.963717

20 August 1986 Clear Defect Photolithographic Mask Repair In Open Air Using Laser-Induced Pyrolytic Decomposition

Zbigniew Drozdowicz, Joel Bornstein, John O'Connor

Proceedings Volume 0633, Optical Microlithography V; (1986) https://doi.org/10.1117/12.963717
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

We are describing a visible wavelength laser driven pyrolytic decomposition of metal carbonyls. Micrometer resolution deposits generated by this process are used to repair clear defects (missing chrome) on photolithographic masks. The process takes place in an open air environment with partial atmosphere control achieved by supply gas flow and venting arrangements. Writing speeds of 5 micrometer per second are achieved with room temperature operation.

Citation Download Citation

Zbigniew Drozdowicz, Joel Bornstein, and John O'Connor "Clear Defect Photolithographic Mask Repair In Open Air Using Laser-Induced Pyrolytic Decomposition", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); https://doi.org/10.1117/12.963717

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