Exposing Patterns With A Scanning Laser System

Shi-kay Yao; Boris Meshman

doi:10.1117/12.963715

20 August 1986 Exposing Patterns With A Scanning Laser System

Shi-kay Yao, Boris Meshman

Proceedings Volume 0633, Optical Microlithography V; (1986) https://doi.org/10.1117/12.963715
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

High quality reticles are made optically using an electro-optical system with sixteen scanning laser beams. Recent advances provide pattern accuracy of ± 0.125 micron. Edge acuity of 0.15 micron three sigma is now routine. Supported by high speed electronics with 160 MHz data rate, it is one of the fastest pattern generators available to date. Since it works in a raster scan mode, it can handle extremely high flash count patterns with ease. With preprocessed data tape, checkerboard type of pattern in 10 micron by 10 micron squares has been printed at a rate of 40,000 square per second (equivalent to 144 million flashes per hour). Another major advantage of this system comes from the use of conventional photo-resists. With a typical environmental chamber, one can fabricate high quality, low pin hole density patterns at high writing speed. Detailed system characteristics as well as pattern generation capabilities will be reported in this paper.

Citation Download Citation

Shi-kay Yao and Boris Meshman "Exposing Patterns With A Scanning Laser System", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); https://doi.org/10.1117/12.963715

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