A blu-ray laser diode based dual-beam interference lithography for fabrication of diffraction gratings for surface encoders

Xiangwen Zhu; Xinghui Li; Qian Zhou; Xiaohao Wang; Kai Ni

doi:10.1117/12.2245710

9 November 2016 A blu-ray laser diode based dual-beam interference lithography for fabrication of diffraction gratings for surface encoders

Xiangwen Zhu, Xinghui Li, Qian Zhou, Xiaohao Wang, Kai Ni

Author Affiliations +

Proceedings Volume 10018, Advanced Laser Processing and Manufacturing; 100180A (2016) https://doi.org/10.1117/12.2245710
Event: SPIE/COS Photonics Asia, 2016, Beijing, China

Abstract

The paper presents a dual-beam interference lithography technology for fabrication of diffraction gratings for surface encoders by using cost-effective 405 nm blu-ray laser diodes. In this system, an amplitude division interferometer system is employed. A laser beam raying from a blu-ray laser diode is collimated and then divided into two beams by a beam splitter. These two beams are changed their propagation directions and interfere with each other. Generated interference fringes are exposed on the photoresist coated substrate. Grating line spacing d can be adjusted by changing the incident angle between these two beams. Grating width W_c that determines the measurement of the surface encoder is decided by the coherence length L_c of the laser diode and the grating line spacing d. Calculation and simulation were carried out to decide the grating width. L_c was experimentally obtained. A fabrication system was constructed to verify the feasibility of this technology. Diffraction gratings with a 2.5 micron line spacing and a 2.5 mm width was obtained.

Citation Download Citation

Xiangwen Zhu, Xinghui Li, Qian Zhou, Xiaohao Wang, and Kai Ni "A blu-ray laser diode based dual-beam interference lithography for fabrication of diffraction gratings for surface encoders", Proc. SPIE 10018, Advanced Laser Processing and Manufacturing, 100180A (9 November 2016); https://doi.org/10.1117/12.2245710

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