Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography

Dakui Lin; Huoyao Chen; Stefanie Kroker; Thomas Käsebier; Zhengkun Liu; Keqiang Qiu; Ying Liu; Ernst-Bernhard Kley; Xiangdong Xu; Yilin Hong; Shaojun Fu

doi:10.1117/12.2246356

31 October 2016 Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography

Dakui Lin, Huoyao Chen, Stefanie Kroker, Thomas Käsebier, Zhengkun Liu, Keqiang Qiu, Ying Liu, Ernst-Bernhard Kley, Xiangdong Xu, Yilin Hong, Shaojun Fu

Author Affiliations +

Proceedings Volume 10022, Holography, Diffractive Optics, and Applications VII; 100220S (2016) https://doi.org/10.1117/12.2246356
Event: SPIE/COS Photonics Asia, 2016, Beijing, China

Abstract

Soft x-ray varied line spacing grating (VLSG), which is a vital optical element for laser plasma diagnosis and spectrometry analysis, is conventionally fabricated by holographic lithography or mechanical ruling. In order to overcome the issues of the above fabrication methods, a method based on electron beam lithography-near field lithography (EBL-NFH) is proposed to make good use of the flexibility of EBL and the high throughput of NFH. In this paper, we showed a newly designed soft x-ray VLSG with a central groove density of 3600 lines/mm, which is to be realized based on EBL-NFH. First, the optimization of the spatial distribution of line density and groove profile of the VLSG was shown. As an important element in NFH, a fused silica mask plays a key role during NFH in order to obtain a required line density of VLSG. Therefore, second, the transfer relationship of spatial distribution of line densities between fused silica mask and resist grating was investigated in different exposure modes during NFH. We proposed a formulation about the transfer of line density to design of the groove density distribution of a fused silica grating mask. Finally, the spatial distribution of line densities between the fused silica mask, which is to be fabrication by using EBL, was demonstrated.

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Dakui Lin, Huoyao Chen, Stefanie Kroker, Thomas Käsebier, Zhengkun Liu, Keqiang Qiu, Ying Liu, Ernst-Bernhard Kley, Xiangdong Xu, Yilin Hong, and Shaojun Fu "Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography", Proc. SPIE 10022, Holography, Diffractive Optics, and Applications VII, 100220S (31 October 2016); https://doi.org/10.1117/12.2246356

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KEYWORDS

Photoresist materials

Photomasks

Electron beam lithography

Diffraction

Lithography

X-rays

Optical design

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