High-Speed Ellipsometer For Thin-Film Deposition Monitoring

W. H. Southwell; W. J. Gunning

doi:10.1117/12.950021

27 February 1989 High-Speed Ellipsometer For Thin-Film Deposition Monitoring

W. H. Southwell, W. J. Gunning

Proceedings Volume 1019, Thin Film Technologies III; (1989) https://doi.org/10.1117/12.950021
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

A conceptual design for a no-moving-parts ellipsometer with a calibration procedure to remove effects of imperfect components and detector sensitivity differences is described. The device is particularly useful for infrared (IR) coating monitoring, where high deposition rates are used and where detectors may be polarization-sensitive. A calibration scheme that uses only linearly polarized beams and no retardation components has been devised.

Citation Download Citation

W. H. Southwell and W. J. Gunning "High-Speed Ellipsometer For Thin-Film Deposition Monitoring", Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); https://doi.org/10.1117/12.950021

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