Paper
20 March 2018 Hybrid hotspot library building based on optical and geometry analysis at early stage for new node development
Ying Chen, Tianyang Gai, Xiaojing Su, Yayi Wei, Yajuan Su, Tianchun Ye
Author Affiliations +
Abstract
As the semiconductor industry enters 20 nm node and beyond, design restrictions and process complexity lay stress on the development for a new technology node. This paper introduces a hybrid hotspot library building method based on simultaneous optical and geometry analysis, which could help explore design rule optimization and enhance cycle time at early stage for new node development. Lithography simulation results verify the accuracy of this method. This method provide a feasible way to build up a preliminary Design Rule Checking (DRC) library even before process-freezing.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ying Chen, Tianyang Gai, Xiaojing Su, Yayi Wei, Yajuan Su, and Tianchun Ye "Hybrid hotspot library building based on optical and geometry analysis at early stage for new node development", Proc. SPIE 10588, Design-Process-Technology Co-optimization for Manufacturability XII, 1058811 (20 March 2018); https://doi.org/10.1117/12.2296834
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Cited by 1 scholarly publication.
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KEYWORDS
Lithography

Image processing

Computer simulations

Double patterning technology

Optics manufacturing

Image analysis

Microelectronics

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