Presentation + Paper
28 February 2020 Strain-engineered group IV light sources for photonic-integrated circuits
Author Affiliations +
Proceedings Volume 11286, Optical Interconnects XX; 112860X (2020) https://doi.org/10.1117/12.2549272
Event: SPIE OPTO, 2020, San Francisco, California, United States
Abstract
Integration of photonic devices with CMOS circuits has recently generated much interest for numerous applications ranging from Internet networks to sensor technology. For example, integrated optical interconnects have emerged as a strong contender to replace bandwidth-hungry and energy-guzzling electrical interconnects in data centers and inside microprocessors. However, the lack of group IV semiconductor materials suitable for light emission has thus far prevented the realization of such important photonic-integrated circuits. In this paper, we will present our research works on strain-engineered group IV light sources on silicon that will help enable photonic-integrated circuits.
Conference Presentation
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Donguk Nam "Strain-engineered group IV light sources for photonic-integrated circuits", Proc. SPIE 11286, Optical Interconnects XX, 112860X (28 February 2020); https://doi.org/10.1117/12.2549272
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KEYWORDS
Germanium

Light sources

Photonic integrated circuits

Nanowires

Heterojunctions

Telecommunications

Tin

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