Fast algorithm of the scanning lithographic metrics based on a quadratic imaging model and an integral transfer function

Zhiyong Yang; Xiuguo Chen; Yating Shi; Hao Jiang; Shiyuan Liu

doi:10.1117/12.2552187

23 March 2020 Fast algorithm of the scanning lithographic metrics based on a quadratic imaging model and an integral transfer function

Zhiyong Yang, Xiuguo Chen, Yating Shi, Hao Jiang, Shiyuan Liu

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Proceedings Volume 11327, Optical Microlithography XXXIII; 1132719 (2020) https://doi.org/10.1117/12.2552187
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

The impacts of aberrations to lithographic metrics, such as defocus, pattern shift and NILS loss, needs to be calculated quickly in numerous applications of the lithography. This paper presents a fast algorithm for calculating these typical lithographic metrics of scanner. Based on the principal component analysis (PCA) of the aberrated lithographic image, the quadratic regression relationship between the principal component (PC) coefficients and Zernike coefficients is established. The quadratic imaging model (QIM) and the gradient information of all PCs are used to calculate the lithographic metrics. Meanwhile, in order to characterize the impacts of spatial varying aberrations on scanning image and the corresponding lithographic metrics, the integral transfer function is used to calculate the PC coefficients of the aberrated scanning image.

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Zhiyong Yang, Xiuguo Chen, Yating Shi, Hao Jiang, and Shiyuan Liu "Fast algorithm of the scanning lithographic metrics based on a quadratic imaging model and an integral transfer function", Proc. SPIE 11327, Optical Microlithography XXXIII, 1132719 (23 March 2020); https://doi.org/10.1117/12.2552187

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KEYWORDS

Lithography

Nanoimprint lithography

Turbulence

Principal component analysis

Coherence imaging

Image processing

Imaging systems

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